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US Patent Issued to Hitachi High-Tech on Sept. 22 for "Sample holder and analysis system" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,179, issued on Sept. 22, was assigned to Hitachi High-Tech Corp. (Tokyo). "Sample holder and analysis system" was invented by Hiroyuki Asa... Read More


US Patent Issued to FEI on Sept. 22 for "Method and system for analyzing three-dimensional features" (Chinese, American Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,180, issued on Sept. 22, was assigned to FEI Co. (Hillsboro, Ore.). "Method and system for analyzing three-dimensional features" was inven... Read More


US Patent Issued to ASML NETHERLANDS on Sept. 22 for "Electron beam apparatus, inspection tool and inspection method" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,181, issued on Sept. 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Electron beam apparatus, inspection tool and ins... Read More


US Patent Issued to Kokusai Electric on Sept. 22 for "Substrate processing apparatus, method of manufacturing semiconductor device and plasma generating apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,182, issued on Sept. 22, was assigned to Kokusai Electric Corp. (Tokyo). "Substrate processing apparatus, method of manufacturing semicond... Read More


US Patent Issued to Eagle Harbor Technologies on Sept. 22 for "Efficient energy recovery in a nanosecond pulser circuit" (Washington Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,183, issued on Sept. 22, was assigned to Eagle Harbor Technologies Inc. (Seattle). "Efficient energy recovery in a nanosecond pulser circu... Read More


US Patent Issued to Advanced Energy Industries on Sept. 22 for "Integrated control of a plasma processing system" (Colorado Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,184, issued on Sept. 22, was assigned to Advanced Energy Industries Inc. (Denver). "Integrated control of a plasma processing system" was ... Read More


US Patent Issued to Applied Materials on Sept. 22 for "Chamber impedance management in a processing chamber" (California Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,185, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Chamber impedance management in a processing chamb... Read More


US Patent Issued to Tokyo Electron on Sept. 22 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,186, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus and plasma processing method" was inven... Read More


US Patent Issued to Tokyo Electron on Sept. 22 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,187, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Kazushi Kaneko (Yamana... Read More


US Patent Issued to ULVAC on Sept. 22 for "Etching method" (South Korean, Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,188, issued on Sept. 22, was assigned to ULVAC INC. (Chigasaki, Japan). "Etching method" was invented by Kazuhiko Tonari (Chigasaki, Japan... Read More